Question:
_____ is used for the removal of SiO2 from desired regions such that the desired impurities can be diffused.
_____ is used for the removal of SiO2 from desired regions such that the desired impurities can be diffused.
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Photo etching is essential for creating patterns on semiconductor wafers, enabling the diffusion of dopants in specific regions.
Updated On: May 5, 2025
- Photo etching
- Epitaxial growth
- Oxidation
- Chemical Vapour Deposition
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The Correct Option is A
Solution and Explanation
Photo etching is a process used in the semiconductor industry to remove SiO2 from certain areas of the wafer. This allows for the diffusion of desired impurities into the regions that were not covered by the SiO2.
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