Question:

What is the standard wavelength used in Extreme Ultraviolet (EUV) lithography?

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EUV lithography wavelength → {13.5 nm}
Updated On: Mar 15, 2026
  • 248 nm
  • 193 nm
  • 13.5 nm
  • 365 nm
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The Correct Option is C

Solution and Explanation

Concept:
Lithography is a key process in semiconductor manufacturing used to transfer patterns onto silicon wafers. As device sizes shrink to the nanoscale, shorter wavelengths of light are required to achieve higher resolution.
Step 1:Understanding EUV lithography.
Extreme Ultraviolet (EUV) lithography is an advanced lithographic technique used in modern semiconductor fabrication to produce extremely small integrated circuit features.
Step 2:Wavelength used in EUV systems.
EUV lithography uses radiation with a wavelength of approximately: \[ 13.5 \ \text{nm} \] This extremely short wavelength enables patterning of very small transistor features used in modern processors.
Step 3:Importance in nanotechnology.
EUV lithography is widely used in advanced semiconductor manufacturing nodes such as 7 nm, 5 nm, and smaller technologies. Conclusion:
Therefore, the standard wavelength used in EUV lithography is 13.5 nm.
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