Question:

Match the processes with their characteristics:

Show Hint

Using the process of elimination often helps in matching questions. For example, knowing that EDM (P) requires conductive materials immediately points to P-2, narrowing the correct options down significantly.
Updated On: Jul 9, 2026
  • P-2, Q-3, R-1, S-4
  • P-3, Q-2, R-1, S-4
  • P-3, Q-2, R-4, S-1
  • P-2, Q-4, R-3, S-1
Show Solution
collegedunia
Verified By Collegedunia

The Correct Option is A

Solution and Explanation

Step 1: Understanding the Question:
This question requires us to match non-traditional machining processes with their defining operational characteristics or typical material applications.

Step 2: Key Formula or Approach:

We evaluate the working principles and applications of each listed advanced machining method:
- EDM (Electrical Discharge Machining) relies on spark erosion, which only works on electrically conductive workpieces.
- USM (Ultrasonic Machining) uses abrasive slurry and high-frequency mechanical vibration, making it ideal for brittle materials like glass.
- CHM (Chemical Machining) dissolves material via chemical reaction, which induces no physical or thermal forces, resulting in zero residual stresses.
- IBM (Ion Beam Machining) removes material at the atomic/molecular level, which is used for nanoscale precision machining.

Step 3: Detailed Explanation:


P - Electrical Discharge Machining (EDM):
- Since it relies on electrical sparks between an electrode and the workpiece, the material must be conductive. Thus, it matches with 2 (Machining of electrically conductive materials).

Q - Ultrasonic Machining (USM):
- It is highly suitable for hard and brittle non-conductive materials. Glass is a prime application. Thus, it matches with 3 (Machining of glass).

R - Chemical Machining (CHM):
- Since material removal occurs via chemical dissolution without mechanical forces or heat-affected zones, it produces no residual stresses. Thus, it matches with 1 (No residual stress).

S - Ion Beam Machining (IBM):
- IBM removes material at the atomic level using a focused beam of ions, making it useful for micro- and nano-scale operations. Thus, it matches with 4 (Nanomachining).

Step 4: Final Answer:

The correct matching sequence is P-2, Q-3, R-1, S-4.
Was this answer helpful?
0
0